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Filed: AOS (pnd) Country: Russia
Timeline

Thanks to VJ a lot of questions have been solved so far and things have been relatively clear but now there is that patronymic problem again.

In all prior forms G-325A and I-129F I avoided using patronymic since it's NOT a middle name (as mentioned multiple times before it's technically dad's name) and as I understand there are quite a few people who did the same. However, I've come across the local US embassy instruction for the DS160 form to put your patronymic together with your name in "given names" line. I haven't seen that instruction before and following my foreign passport, common sense and the forum I didn't use patronymic at all.

Now the question itself:

1. Can I just omit patronymic in DS160 and only use my first and last name like I did in all other forms?

2. If I still have to use it will there be a problem if I didn't use patronymic in any of the forms before but put it as they say as "given names" for DS160 now? Will it be considered a mistake or cheating?

I know these type of questions are asked now and then and I have read a lot on this forum and some others, but there are 50/50 answers as to do it or not to do it so I'm still confused and don't want to seem as if I was trying to conceal information, I just don't want to be using patronymic as my middle name since it's NOT one.

We already got our NOA2, no RFE, the name on NOA 2 is just first and last. The embassy I will be interviewed at is in Moscow, Russia.

K1:

Service Center: California
I-129F Sent: 2016-02-02
I-129F NOA1: 2016-02-08
I-129F NOA2: 2016-04-08
I-129F NOA2(paper): 2016-04-14

NVC case# assigned: 2016-04-28

In transit: 2016-05-02

Ready 2016-05-04

Administrative processing 2016-05-10

Email from the embassy: 2016-05-11

Medical: 2016-05-12

Interview: 2016-05-25 - approved!

POE: 6/18/2016

SSN received: 07/01/2016

Marriage: 07/15/2016

AOS:

AOS/EAD/AP filed: 07/26/2016

Text/email notifications: 08/02/2016

Check cashed 08/03/2016

NOA1 for AOS/EAD/AP 08/08/2016

Biometrics: 08/25/2016

EAD/AP 10/25/2016

Interview 09/19/2017

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